JPH0512280Y2 - - Google Patents
Info
- Publication number
- JPH0512280Y2 JPH0512280Y2 JP1987115783U JP11578387U JPH0512280Y2 JP H0512280 Y2 JPH0512280 Y2 JP H0512280Y2 JP 1987115783 U JP1987115783 U JP 1987115783U JP 11578387 U JP11578387 U JP 11578387U JP H0512280 Y2 JPH0512280 Y2 JP H0512280Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- nozzle
- reaction chamber
- sih
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987115783U JPH0512280Y2 (en]) | 1987-07-27 | 1987-07-27 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987115783U JPH0512280Y2 (en]) | 1987-07-27 | 1987-07-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6437464U JPS6437464U (en]) | 1989-03-07 |
JPH0512280Y2 true JPH0512280Y2 (en]) | 1993-03-29 |
Family
ID=31357744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987115783U Expired - Lifetime JPH0512280Y2 (en]) | 1987-07-27 | 1987-07-27 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0512280Y2 (en]) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5945926U (ja) * | 1982-09-20 | 1984-03-27 | 富士通株式会社 | 化学気相成長装置 |
JPS6082668A (ja) * | 1983-10-07 | 1985-05-10 | Hitachi Tokyo Electronics Co Ltd | ガス流量制御装置 |
JPH0713946B2 (ja) * | 1985-05-24 | 1995-02-15 | 株式会社日立製作所 | Cvd装置 |
-
1987
- 1987-07-27 JP JP1987115783U patent/JPH0512280Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6437464U (en]) | 1989-03-07 |
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